7300Lsi Automated X-ray Diffractometer

The 7300LSI is an automated X-ray diffractometer designed for in-fab R&D and in-line production process monitoring of semiconductor films on full wafers. The system offers multiple measurement modes in one tool including X-ray reflectivity (XRR), high-resolution XRD (HRXRD), grazing-incidence XRD, and wide-angle XRD for strain metrology, thin film characterization, and phase analysis on blanket wafers. Optional S and I channels add µHRXRD and in-plane diffraction capabilities. The system features full automation for measurement configuration switching, alignment, operation, analysis, and reporting. The 7300LSI provides full wafer mapping for all sizes and automates handling of standard and transparent substrates. Key applications include characterization of epitaxial films for advanced logic chips, High-K thickness/density/crystallinity for DRAM and NAND, GaN on Si for power transistors, and advanced materials for future node development. The system is utilized worldwide in advanced nodes logic and memory fabs.